KOLZER manufactures and supplies vacuum coating plants.
For over 60 years, Kolzer has built plant that redefine vacuum coating standards and capabilities from the iconic DGK36" to the supreme MK63".
It joined the field with an initial activity of assembling very complex vacuum systems and in 1952 it projected and constructed the first high vacuum deposition plant.
Today it has a strong well - established position as a leader on the European and world markets, the existance of more than 1000 KOLZER plants are testimony of this.
The KOLZER plants use vacuum (a condition of low pressure) and:
- Sources of condensable molecular or atomic vapors to deposit thin films and coatings (for surface finishings).
- Plasma sources (for surface modifications and reactions).
The vacuum condition is used not only to reduce the density of the gas particles but also to carry out the process in an uncontaminated environment. By establishing a controlled pressure, and if necessary emitting gas fluxes, the gas environment created can be in the form of a Plasma (party ionized gas).
The source of vapor can be in the form of a solid surface (physical vapor deposition - PVD), or liquid (chemical vapor deposition - CVD).